Clifford L. Henderson: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - A study of the photo acid generator material design for chemically amplified photoresists

Utsumi, Y., Henderson, Clifford L., Seshimo, T., Komuro, Y., Kawaue, A., Ishiduka, K., Matsuzawa, K., Hada, Hideo, Onodera, J.

Year:

2009

Language:

english

File:

PDF, 567 KB

english, 2009

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Investigating SEM metrology effects using a detailed SEM simulation and stochastic resist model

Cain, Jason P., Sanchez, Martha I., Lawson, Richard A., Henderson, Clifford L.

Year:

2015

Language:

english

File:

PDF, 2.36 MB

english, 2015

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Improvements in process performance for immersion technology high volume manufacturing

Nafus, K., Henderson, Clifford L., Shimoaoki, T., Enomoto, M., Shite, H., Otsuka, T., Kosugi, H., Shibata, T., Mallmann, J., Maas, R., Verspaget, C., van der Heijden, E., van Setten, E., Finders, J.,

Year:

2009

Language:

english

File:

PDF, 1.29 MB

english, 2009

4

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Formation mechanism of 193nm immersion defects and defect reduction strategies

Henderson, Clifford L., Wei, Yayi, Brandl, Stefan, Goodwin, Frank

Year:

2008

Language:

english

File:

PDF, 529 KB

english, 2008

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Statistical simulation of photoresists at EUV and ArF

Biafore, John J., Smith, Mark D., Mack, Chris A., Thackeray, James W., Gronheid, Roel, Robertson, Stewart A., Graves, Trey, Blankenship, David, Henderson, Clifford L.

Year:

2009

Language:

english

File:

PDF, 923 KB

english, 2009

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - CD and defect improvement challenges for immersion processes

Ehara, Keisuke, Henderson, Clifford L., Ema, Tatsuhiko, Yamasaki, Toshinari, Nakagawa, Seiji, Ishitani, Seiji, Morita, Akihiko, Kim, Jeonghun, Kanaoka, Masashi, Yasuda, Shuichi, Asai, Masaya

Year:

2009

Language:

english

File:

PDF, 773 KB

english, 2009

7

Simulation study of the effect of differences in block energy and density on the self-assembly of block copolymers

Lawson, Richard A., Peters, Andrew J., Nation, Benjamin, Ludovice, Peter J., Henderson, Clifford L.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2014

Language:

english

File:

PDF, 8.80 MB

english, 2014

8

Independent learning crossing cultures: learning cultures and shifting meanings

Spiro, Jane, Henderson, Juliet, Clifford, Valerie

Journal:

Year:

2012

Language:

english

File:

PDF, 127 KB

english, 2012

9

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Synthesis of novel α-fluoroacrylates and related polymers for immersion lithography

Yamashita, Tsuneo, Ishikawa, Takuji, Morita, Masamichi, Kanemura, Takashi, Aoyama, Hirokazu, Henderson, Clifford L.

Year:

2008

Language:

english

File:

PDF, 279 KB

english, 2008

10

Coarse-grained molecular dynamics modeling of the kinetics of lamellar block copolymer defect annealing

Peters, Andrew J., Lawson, Richard A., Nation, Benjamin D., Ludovice, Peter J., Henderson, Clifford L.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 5.25 MB

english, 2016

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials

Henderson, Clifford L., Rathsack, Ben M., Scheer, Steven, Kuwahara, Yuhei, Kitano, Junichi, Gronheid, Roel, Baerts, Christina

Year:

2008

Language:

english

File:

PDF, 381 KB

english, 2008

12

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Process latitude simulation of positive-tone litho-litho-etch double patterning

Printz, Wallace P., Henderson, Clifford L., Scheer, Steven A.

Year:

2009

Language:

english

File:

PDF, 524 KB

english, 2009

13

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Non-ionic photoacid generators for chemically amplified resists: chromophore effect on resist performance

Nishimae, Yuichi, Yamato, Hitoshi, Asakura, Toshikage, Ohwa, Masaki, Henderson, Clifford L.

Year:

2008

Language:

english

File:

PDF, 272 KB

english, 2008

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Development of materials and processes for negative tone development toward 32-nm node 193-nm immersion double-patterning process

Tarutani, Shinji, Henderson, Clifford L., Hideaki, Tsubaki, Kamimura, Sou

Year:

2009

Language:

english

File:

PDF, 2.16 MB

english, 2009

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Optimization of BARC process for hyper-NA immersion lithography

Henderson, Clifford L., Lee, Kilyoung, Lee, Junghyung, Lee, Sungkoo, Park, Dongheok, Bok, Cheolkyu, Moon, Seungchan

Year:

2008

Language:

english

File:

PDF, 381 KB

english, 2008

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Microbridge and e-test opens defectivity reduction via improved filtration of photolithography fluids

Mesawich, Michael, Henderson, Clifford L., Sevegney, Michael, Gotlinsky, Barry, Reyes, Santos, Abbott, Patrick, Marzani, Jeremy, Rivera, Mario

Year:

2009

Language:

english

File:

PDF, 341 KB

english, 2009

17

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Influence of film thickness, molecular weight, and substrate on the physical properties of photoresist polymer thin films

Singh, Lovejeet, Ludovice, Peter J., Henderson, Clifford L., Fedynyshyn, Theodore H.

Year:

2003

Language:

english

File:

PDF, 167 KB

english, 2003

18

Calculations of the free energy of dislocation defects in lamellae forming diblock copolymers using thermodynamic integration

Peters, Andrew J., Lawson, Richard A., Nation, Benjamin D., Ludovice, Peter J., Henderson, Clifford L.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 2.98 MB

english, 2016

19

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Synthesis and properties of new anionic photoacid generators bound polymer resists for e-beam and EUV lithography

Henderson, Clifford L., Wang, Mingxing, Lee, Cheng-Tsung, Henderson, Clifford L., Yueh, Wang, Roberts, Jeanette M., Gonsalves, Kenneth E.

Year:

2008

Language:

english

File:

PDF, 549 KB

english, 2008

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Characterization of resist and topcoat properties for immersion lithography

Henderson, Clifford L., Jain, Kaveri, Hishiro, Yoshi

Year:

2008

Language:

english

File:

PDF, 694 KB

english, 2008

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Analysis of the effect of point-of-use filtration on microbridging defectivity

Braggin, J., Gronheid, R., Cheng, S., Van Den Heuvel, D., Bernard, S., Foubert, P., Rosslee, C., Henderson, Clifford L.

Year:

2009

Language:

english

File:

PDF, 828 KB

english, 2009

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Dependence of acid generation efficiency on acid molecular structure and concentration of acid generator in chemically amplified EUV resist

Henderson, Clifford L., Hirose, Ryo, Kozawa, Takahiro, Tagawa, Seiichi, Kai, Toshiyuki, Shimokawa, Tsutomu

Year:

2008

Language:

english

File:

PDF, 270 KB

english, 2008

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Improvements of adhesion and hydrophobicity of wafer bevel in water immersion lithography

Henderson, Clifford L., Ishibash, Takeo, Terai, Mamoru, Hagiwara, Takuya, Kumada, Teruhiko, Hanawa, Tetsuro, Takebe, Yoko, Yokokoji, Osamu, Fujiwara, Tomoharu, Akiyama, Hiroshi

Year:

2008

Language:

english

File:

PDF, 324 KB

english, 2008

24

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Characterization of film cut position at wafer bevel for effective immersion lithography process

Matsumaro, Kazuyuki, Henderson, Clifford L., Seki, Miyoshi, Kato, Takeshi

Year:

2009

Language:

english

File:

PDF, 682 KB

english, 2009

25

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Monte Carlo simulation on line edge roughness after development in chemically amplified resist of post-optical lithography

Henderson, Clifford L., Saeki, Akinori, Kozawa, Takahiro, Tagawa, Seiichi, Cao, Heidi B., Deng, Hai, Leeson, Michael J.

Year:

2008

Language:

english

File:

PDF, 602 KB

english, 2008

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Methods of controlling cross-linking in negative-tone resists

Wallow, Thomas I., Hohle, Christoph K., Lawson, Richard A., Chun, Jun Sung, Neisser, Mark, Tolbert, Laren M., Henderson, Clifford L.

Year:

2014

Language:

english

File:

PDF, 1.05 MB

english, 2014

27

Estrogen-Receptor Status and Outcomes of Modern Chemotherapy for Patients With Node-Positive Breast Cancer

Berry, Donald A., Cirrincione, Constance, Henderson, I. Craig, Citron, Marc L., Budman, Daniel R., Goldstein, Lori J., Martino, Silvana, Perez, Edith A., Muss, Hyman B., Norton, Larry, Hudis, Clifford

Journal:

JAMA The Journal of the American Medical Association

Year:

2006

Language:

english

File:

PDF, 232 KB

english, 2006

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Self-segregating materials for immersion lithography

Henderson, Clifford L., Sanders, Daniel P., Sundberg, Linda K., Brock, Phillip J., Ito, Hiroshi, Truong, Hoa D., Allen, Robert D., McIntyre, Gregory R., Goldfarb, Dario L.

Year:

2008

Language:

english

File:

PDF, 1.53 MB

english, 2008

29

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - LWR reduction in low-k1 ArF-immersion lithography

Matsunaga, Kentaro, Oori, Tomoya, Kato, Hirokazu, Kawamura, Daisuke, Shiobara, Eishi, Inatomi, Yuichiro, Kawasaki, Tetsu, Iwashita, Mitsuaki, Ito, Shinichi, Henderson, Clifford L.

Year:

2008

Language:

english

File:

PDF, 1.47 MB

english, 2008

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Line width roughness (LWR) performance of novel surface conditioner solutions for immersion lithography

Henderson, Clifford L., Lu, Bo Jou, Liu, E. T., Zeng, Anson, Tseng, Aroma, Wu, Steven, Lin, Bill, Yu, Chun Chi, Meng, Ling-Jen, Jaramillo, Jr., Manuel, Liao, Ming-Ching

Year:

2008

Language:

english

File:

PDF, 2.58 MB

english, 2008

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Properties of the novel de-protecting unit for next generation ArF resist polymer

Shibuya, Akinori, Yamaguchi, Shuhei, Yoshida, Yuko, Shirakawa, Michihiro, Henderson, Clifford L.

Year:

2009

Language:

english

File:

PDF, 330 KB

english, 2009

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Process manufacturability evaluation for next generation immersion technology node

Henderson, Clifford L., Enomoto, M., Shimoaoki, T., Otsuka, T., Hatakeyama, S., Nafus, K., Naito, R., Terashita, Y., Shibata, T., Kosugi, H., Jyousaka, M., Mallmann, J., Maas, R., Blanco Mantecon, M.,

Year:

2008

Language:

english

File:

PDF, 832 KB

english, 2008

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Silicon-based anti-reflective spin-on hardmask materials for 45 nm pattern of immersion ArF lithography

Henderson, Clifford L., Kim, Sang Kyun, Cho, Hyeon Mo, Koh, Sang Ran, Kim, Mi-young, Yoon, Hui Chan, Chung, Yong-jin, Kim, Jong Seob, Chang, Tuwon

Year:

2008

Language:

english

File:

PDF, 352 KB

english, 2008

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Embedded micro/nano channel formation for three-dimensional negative-tone photoresist microstructuring

Kim, Sang-Kon, Henderson, Clifford L., Oh, Hye-Keun, Jung, Young-Dae, An, Ilsin

Year:

2009

Language:

english

File:

PDF, 730 KB

english, 2009

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Development of new phenylcalix[4]resorcinarene: its application to positive-tone molecular resist for EB and EUV lithography

Echigo, Masatoshi, Oguro, Dai, Henderson, Clifford L.

Year:

2009

Language:

english

File:

PDF, 2.08 MB

english, 2009

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - DUV-assisted e-beam resist process

Chen, Wei-Su, Henderson, Clifford L., Li, Yen-Cheng, Tsai, Ming-Jinn

Year:

2009

Language:

english

File:

PDF, 1.06 MB

english, 2009

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Development of new BARC for immersion process using hyper NA

Henderson, Clifford L., Roh, Hyo Jung, Han, Man Ho, Kim, Sang Jeoung, Kim, Hyun Jin, Kim, Jaehyun, Kong, Keun Kyu, Lee, Ki Lyoung, Lee, Sung Koo, Park, Dong Heok

Year:

2008

Language:

english

File:

PDF, 1.68 MB

english, 2008

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Molecular glass resists for next-generation lithography

Krysak, Marie, Henderson, Clifford L., De Silva, Anuja, Sha, Jing, Lee, Jin-Kyun, Ober, Christopher K.

Year:

2009

Language:

english

File:

PDF, 425 KB

english, 2009

39

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Controlling etch properties of silicon-based antireflective spin-on hardmask materials

Kim, Sang Kyun, Cho, Hyeon Mo, Woo, Changsoo, Koh, Sang Ran, Kim, Mi-Young, Yoon, Hui Chan, Lee, Woojin, Shin, Seung-Wook, Kim, Jong Seob, Chang, Tuwon, Henderson, Clifford L.

Year:

2009

Language:

english

File:

PDF, 535 KB

english, 2009

40

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Resist process control for 32-nm logic node and beyond with NA > 1.30 immersion exposure tool

Nagahara, Seiji, Henderson, Clifford L., Takahata, Kazuhiro, Nakagawa, Seiji, Murakami, Takashi, Takeda, Kazuhiro, Nakamura, Shinpei, Ueki, Makoto, Satake, Masaki, Ema, Tatsuhiko, Fujise, Hiroharu, Yo

Year:

2009

Language:

english

File:

PDF, 1.28 MB

english, 2009

41

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Process development for high scan speed ArF immersion lithography

Henderson, Clifford L., Matsumura, Nobuji, Sugie, Norihiko, Goto, Kentaro, Fujiwara, Koichi, Yamaguchi, Yoshikazu, Tanizaki, Hirokazu, Nakano, Katsushi, Fujiwara, Tomoharu, Wakamizu, Shinya, Takeguchi

Year:

2008

Language:

english

File:

PDF, 768 KB

english, 2008

42

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - PAG segregation during exposure affecting innate material roughness

Fedynyshyn, Theodore H., Astolfi, David K., Cabral, Alberto, Cann, Susan, Pottebaum, Indira, Roberts, Jeanette M., Henderson, Clifford L.

Year:

2009

Language:

english

File:

PDF, 183 KB

english, 2009

43

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - High-index resist for 193-nm immersion lithography

Matsumoto, Kazuya, Costner, Elizabeth, Nishimura, Isao, Ueda, Mitsuru, Willson, C. Grant, Henderson, Clifford L.

Year:

2008

Language:

english

File:

PDF, 648 KB

english, 2008

44

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Study of de-protection reaction analysis system for EUV lithography

Henderson, Clifford L., Sekiguchi, A., Kono, Y.

Year:

2008

Language:

english

File:

PDF, 522 KB

english, 2008

45

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Materials for single-etch double patterning process: surface curing agent and thermal cure resist

Bae, Young C., Henderson, Clifford L., Liu, Yi, Cardolaccia, Thomas, McDermott, John C., Trefonas, Peter, Spizuoco, Ken, Reilly, Michael, Pikon, Amandine, Joesten, Lori, Zhang, Gary G., Barclay, Georg

Year:

2009

Language:

english

File:

PDF, 823 KB

english, 2009

46

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Advances in Resist Materials and Processing Technology XXV - Rigorous physical modeling of a materials-based frequency doubling lithography process

Henderson, Clifford L., Robertson, Stewart A., Biafore, John J., Graves, Trey, Smith, Mark D.

Year:

2008

Language:

english

File:

PDF, 741 KB

english, 2008

47

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Three-dimensional mesoscale model for the simulation of LER in photoresists

Lawson, Richard A., Allen, Robert D., Henderson, Clifford L.

Year:

2010

Language:

english

File:

PDF, 386 KB

english, 2010

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Alternative Lithographic Technologies V - Tuning domain size of block copolymers for directed self assembly using polymer blending: molecular dynamics simulation studies

Lawson, Richard A., Tong, William M., Resnick, Douglas J., Peters, Andrew J., Ludovice, Peter J., Henderson, Clifford L.

Year:

2013

Language:

english

File:

PDF, 401 KB

english, 2013

49

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - A study of reactive adhesion promoters and their ability to mitigate pattern collapse in thin film lithography

Yeh, Wei-Ming, Allen, Robert D., Somervell, Mark H., Lawson, Richard A., Tolbert, Laren M., Henderson, Clifford L.

Year:

2011

Language:

english

File:

PDF, 895 KB

english, 2011

50

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Stochastic modeling in lithography: the use of dynamical scaling in photoresist development

Mack, Chris A., Henderson, Clifford L.

Year:

2009

Language:

english

File:

PDF, 271 KB

english, 2009

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